ULTRA for Process Analytics

Delivering industry-leading trace/ultra-trace moisture measurements, the DF-750 ULTRA is optimized for quality monitoring in the ultra-high-purity (UHP) gases used in 300mm semiconductor fabs. Delivers industry-best moisture measurements. Industry-leading 55 ppt Lower Detection Limit. Zero-drift stability extends calibration intervals. Measures in N2, H2, He, Ar and 02. Designed to meet exceptional gas purity standards.

Designed for industry-leading quality control measurements in UHP bulk gases, the compact DF-760E ULTRA is a unique dual-analysis solution for trace and ultra-trace moisture and oxygen. Dual moisture/oxygen analyser for UHP gases. Ideal for quality checking and leak detection. Lower Detection Limit of 55ppt moisture Oxygen Lower Detection Limit of 45ppt Combines Coulometric and TDL sensing Broad detection ranges.

Using proven ultra-trace sensing, the NanoChrome ULTRA conquers the most stringent demands of the semiconductor industry, delivering a cost-effective solution compared to competing technologies. The top choice for ultra-trace purity measurements. Designed for the semiconductor wafer industry. Superior measurements of ultra-high- purity gases. Highly specific, non-depleting PED sensing. ProPeak filtering for highly sensitive measurements. Removes the need for flammable fuel gas.

A superior quality control solution for ultra-high-purity (UHP) electronic grade gases, the DF-560E Ultra delivers an industry-best detection of 45 parts per trillion for oxygen (O2). Delivers industry-best oxygen measurements. For quality control in ultra-high-purity gases. Lower Detection Limit of 45 parts-per- trillion. High-stability Coulometric sensing technology. Optimised for ease of use and portability. Cost-effective setup and configuration.